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VAD-process Synthetic Fused Silica SK-1300

Our Company successfully developed synthetic fused silica SK-1300 as a result of significant improvements made to the conventional VAD (vapor-phase axial deposition) method of optical fiber manufacturing technology.

SK-1300 is extremely high in purity and much lower in OH content than the traditional direct method, thus making it the first synthetic fused silica usable in the semiconductor and liquid crystal display industries.

SK-1300 is the state-of-the-art technology in optical characteristics because it provides a high ultraviolet transmission, no micro inclusion and a solarization resistance, in addition to heat resistance, mechanical strength, and chemical resistance.

These products can be used in a wide variety of industrial applications for semiconductors, optical and all physical or chemical related research featuring these applications:

  • Wafers for various types of devices such as TFT(poly-Si thin-film transistor LCD.), SOI (Silicon on Insulator) etc.
  • Photomask substrates for ultra-LSI and LCD.
  • Reactor furnace tubes, jigs and tools for ULSI manufacturing processes.
  • Electrical-discharge lamp tubes.
  • Optical elements, Ienses, mirrors and windows, for ultraviolet and vacuum ultraviolet.

Typical Impurity Analysis

ppb

Element Analytical value Element Analyltcal value
Al <10 Co <10
Fe <10 Ni <10
Ti <10 P <10
Ca <10 B <10
Mg <10 Na <10
Mn <10 K <10
Cr <10 Li <10
Cu <10 Zr <10
OH <200(ppm)   <1
(Typical values Not guaranteed)

Chemical Resistance


Solution Treatment temperatures(°C) & hours(H) Weight loss(mg/cm2)
H2O 95 45 0.0001-0.0002
1/100 N HNO3 115 24 0.005 -0.01
5% NaOH 100 10 1.35
(Typical values Not guaranteed)

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Transmission


Transmission

(Typical values Not guaranteed)

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Refractive Index



Wavelength(nm,in air)

25°C in air

20°C in air
365.015(i) 1.47465 1.47459
404.656(h) 1.46972 1.46967
435.835(g) 1.46680 1.46675
486.133(F) 1.46323 1.46318
546.075(e) 1.46018 1.46013
587.562(d) 1.45857 1.45852
656.273(c) 1.45647 1.45642

Measuring accuracy ±5×10-6

20°C-25°C in air
Wavelength(nm,in air)
1×10-6/°C
dn/dt
365.015(i) 11.2
404.656(h) 10.8
435.835(g) 10.6
486.133(F) 10.3
546.075(e) 10.1
587.562(d) 10.0
656.273(c) 9.9

Measuring accuracy ±0.6×10-6

(Typical values Not guaranteed)

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Optical Qualities


Item Grade
Bubbles 0-0.03mm2/100cm3
Striae Grade A in one direction (As per Mil-G-174)
Birefrengence (Strain) 10nm/cm and under
Fluorescence Not permitted (Excited wavelength 254nm)
(Typical values Not guaranteed)

Physical properties


Item Unit Value Item Unit Value
Density g/cm3 2.2 Coefficient of thermal expansion 1/K 5.5×10-7
Young's module GPa 72.4      
Torsional rigidity GPa 30.9 Softening point °C 1600
Poisson's ratio   0.17 Annealing point °C 1160
Compression strength GPa 1.1 Strain point °C 1060
Bending strength MPa 69      
Tensile strength MPa 55 Specific heat(25°C) kJ/kgK 0.73
Vickers hardness GPa 8.8-10.1 Thermal conductivity ratio(25°C)
W/mK
1.3
Knoop hardness GPa 6.4-7.0 Thermal conductivity ratio(100°C) W/mK 1.4
(Typical values Not guaranteed)



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